Vacuum Coating Equipment Marketing Forecast Report for The Next 5 Years

Vacuum Coating Equipment Market Growth, Forecast And Analysis Report From 2016 To 2021

Global Vacuum Coating Equipment Market Outlook 2016-2021, has been prepared based on the synthesis, analysis, and interpretation of information about the global Vacuum Coating Equipment market collected from specialized sources.

This report provides detailed analysis of worldwide markets for Vacuum Coating Equipment from 2011-2016, and provides extensive market forecasts (2016-2021) by region/country and subsectors. It covers the key technological and market trends in the Vacuum Coating Equipment market and further lays out an analysis of the factors influencing the supply/demand for Vacuum Coating Equipment, and the opportunities/challenges faced by industry participants. It also acts as an essential tool to companies active across the value chain and to the new entrants by enabling them to capitalize the opportunities and develop business strategies.

A vacuum thin-film coating system applies a thin coat on the object in a vacuum chamber. Although the thickness of the film varies from product to product, the average is 0.1 to several dozen micrometers, which is thinner than aluminum foil for household use (several dozen micrometers). Vacuum coating using vacuum environment through physical or chemical methods in order to coating a thin membrane in the surface of solid material (called a backing material, base board or substrate) such as glass, metal, ceramic, plastic or organic materials. The coating layer usually adopt materials such as metals, alloys and compounds which makes the base materials has some function, for example radiation protection, increase the transmitting, conductivity, permeability, insulation, wear resistance, high temperature resistance, corrosion resistance, oxidation resistance and decoration. The process is a method to achieve significant technical and economic benefit target, the purpose also including improve the product quality, promote environmental protection, saving energy, extend the product life and improve the original properties.

GCC’s report, Global Vacuum Coating Equipment Market Outlook 2016-2021, has been prepared based on the synthesis, analysis, and interpretation of information about the global Vacuum Coating Equipment market collected from specialized sources. The report covers key technological developments in the recent times and profiles leading players in the market and analyzes their key strategies.

The report provides separate comprehensive analytics for the North America, Europe, Asia-Pacific, Middle East and Africa and Rest of World. In this sector, global competitive landscape and supply/demand pattern of Vacuum Coating Equipment industry has been provided.

Source by SVC, Published on July 07, 2016

Hard Coating by PVD Process

Hard Coatings and Coating Properties

1. Hard coatings, formed by reactive Physical Vapor Deposition ( PVD) processes, are becoming widely used in the decorative coating and tool industries.

2. Hard, decorative PVD coatings are more resistant to wear and corrosion than are electroplated decorative coatings, such as gold and brass, which must use a polymer topcoat for protection.

3. Such decorative, hard coatings are being used on plumbing fixtures, sporting goods, metal dinnerware, eyeglass frames, door hardware, and other such applications where the coating is subjected to wear, abrasion, and corrosion during use and cleaning. Titanium nitride ( TiN) is used for a gold-colored coating and zirconium nitride ( ZrN) looks like brass. Titanium carbonitride ( TiC_xN_y) can have a color that varies from bronze to rose to violet to black, depending on the composition. One manufacturer of door hardware gives a lifetime guarantee on its PVD-coated fixtures.

How to get high quality hard coating film?

1. In order to get the most hard, tense, wear-and corrosion-resistant coating, the substrate temperature should be as high as possible.

2. And concurrent bombardment by energetic atomic-sized particles ( Ion-plating ) during the reactive deposition should be used.

3. When coating temperature-sensitive substrate such as plastics, the temperature must be kept low, and concurrent bombardment can be used to densify the film.

4. One technique for coating temperature-sensitive materials uses the deposition of many thin layers, separated by a cooling period. This is done by mounting the parts on a rotating fixture that is passed in front of the deposition source multiple times.

5. Hard PVD coatings are also used for coating machine tools such as drills, lathe-tool inserts, stamps and punches, and expensive forming tools ( such as injection molds for plastics).

6. The PVD hard coating is advantageous for coating forming tools, in that the process does not change the physical dimensions of the part significantly.

In many cases the TiN coatings can be stripped from the tool surface, for repair and rework, without attacking the substrate material.

Generally the machine tools can be heated or rather high temperatures during deposition. For example, in coating hardened steel drills, the substrate is heated to 450℃ or so before deposition is started. This pre-heating can be done by ion bombardment, which also sputter cleans the surface, or by using other heating sources in the deposition chamber.

7. Industrial tool coatings are typically 1 micron to 15 microns in thickness. In addition to being hard and dense, tool coatings should also have a high fracture toughness to inhibit fracture initiation and propagation, and possibly have some compressive stress to inhibite fracture propagation. The most common tool coatings are: TiN, TiC_xN_y and TiAlN₂, while other coatings-such as zirconium nitride, hafnium nitride, titanium carbide, and chromium nitride-are less commonly used.

Vacuum Sputtering Deposition

What is Vacuum Sputtering Deposition

1. Sputtering deposition is the deposition of particles vaporized from a surface, which is called the “sputtering target,” by the physical sputtering process.
2. Physical sputtering is a nonthermal vaporization process where surface atoms are physically ejected by momentum transfer from an energetic bombarding particle, which is usually a gaseous ion accelerated from a plasma.
3. Sputter deposition can be preformed in a vacuum or low-pressure gas (< 5 m Torr ) where the sputtered particles do not suffer gas phase collisions in the space between the target and the substrate or in a higher gas pressure ( 5- 30 m Torr ) where energetic particles sputtered or reflected from the sputtering target are “ thermalized ” by gas phase collisions before they reach the substrate surface.

Advantages of Sputter Deposition

1. Elements, alloys, and compounds can be sputtered and deposited.

2. The sputtering target provides a stable, long-lived vaporization source.

3. In some configurations the sputtering target provides a large area vaporization source that can be of any shape.

4. In some configurations the sputtering source can be a defined shape, such as a line or segment of a cone.

5. In some configurations reactive deposition can be easily accomplished using reactive gaseous species that are “activated” in a plasma ( i.e. “ reactive sputter deposition ”)

Disadvantages of Sputter Deposition

1. Sputtering rates are low compared to those that can be attained in thermal evaporation.

2. Film properties depend on the “ angle-of-incidence” of the flux of depositing material and at low pressures the amount of bombardment from high-energy neutrals reflected from the sputtering target.

3. In many configurations the deposition flux distribution is nonuniform, requiring fixturing to randomize the position of the substrates in order to obtain films of uniform thickness and properties.

4. Sputtering targets are often expensive, and material utilization may be poor.

5. In some configurations gaseous contamination is not easily removed from the system, and gaseous contaminations are “ activated” in the plasma, thus making film contamination more of a problem than in vacuum evaporation.

6. In some configurations radiation and bombardment from the plasma or sputtering target can degrade the substrate.

7. Sputter deposition is widely used to deposit thin-film metallization on semiconductor material, coatings on architectural glass, reflective coatings on compact discs, magnetic films, dry-film lubricants, and decorative coatings.

Sputtering Methods

DC Sputtering/MFSputtering

Balance Sputtering/Unbalaced Sputtering

Sputtering Coating System

Batch coaters and In-line sputtering coating system for Low-E, ITO film coatings on glass, PET film etc.