CsI High Vacuum Deposition System is exclusively designed for CsI metalization on scintillation screens in an extremely high vacuum environment. The CsI scintillators with 200～600µm thickness range, high uniformity of thickness and brightness performance:
Ultra- High Spatial Resolution of Imaging;
Fast response for sharper imaging;
Class leading edge-to-edge image areas;
Optical absorb layers or reflector layers;
Low patient X-ray dose.
Substrates Applied: TFT glass, Fiber Optic Plate, Amorphous-carbon plate, Aluminum plate
Application: for security check and inspection, high energy physics education, nuclear radiation detection and medical imaging: chest examination, mamography, dental – oral and panoramic.
The model CsI950A+ is updated based on the 1st generation CsI950, its advantages:
1. Efficiency
-CsI-950A+ model comes with 2-rotary rack – structure based on Generation – one CsI-950 model.
-Double-capacity for max. size substrate: 500 x400mm.
2. Repeatability & Reproducibility
-Through high precision parameter control system,
-Automated process control software and program,
-User friendly operation.
3. Reliability
-24/7 days non-stop operation;
-Inficon Film Thickness Controller to monitor the film thickness inline.
-Temperature control accuracy: ±1 ℃, multi-stage setting, automatic temperature data recording and control
-Rotary racks equipped with Servo-Motor for high accuracy and stability.
4. Safety
-High vacuum pump: Magnetic Suspension Molecular Pump, with nitrogen gas blowing device to avoid hazardous material evaporation to the air;
-All electrodes are equipped with safety protection sleeves.
Technical Parameters
| Description | CsI-950 |
CsI-950A+
|
| Deposition chamber (mm)
|
φ950 x H1350 | φ950 x H1350
|
| Loading rotary racks | 1 | 2 |
| Evaporation sources | 2 | 2
|
| Heating method | Iodine tungsten lamp
Max. 1800℃ |
Iodine tungsten lamp
Max. 1800℃ |
| Ultimated vacuum pressure (Pa) | 8.0×10-5Pa | 8.0×10-5Pa |
| Magnetic Suspension Molecular Pump | 1 x 3400L/S | 1 x 3400L/S
|
| Roots Pump | 1 x 490m³/h | 1 x 490m³/h
|
| Rotary Vane Pump | 1 x 300m³/h | 1 x 300m³/h
|
| Deposition Controller | Quartz Control x 1 | Quartz Control x 1
|
| Power Consumption (KW) | Max. approx. 62
Average approx. 32 |
Max. approx. 65
Average approx. 35 |
Layout
Built Time: 2014, totally 4 sets
3 sets CsI950 and 1 set CsI950+
Location: Jiangsu, China